Study of Thin Film Thermocouples
developed by using Anodic Vacuum Arc Technique
Artikel-Nr.:13059555
ISBN:978-384734930-3
Erschienen:01/2012
Aufl. Auflage
Erschienen beiLAP Lambert Academic Publishing
Seitenanzahl:284
Sprache:Englisch
Beschreibung
The aim of this thesis was to investigate the reliability of anodic vacuum arc plasma deposition technique in developing thin film thermocouples. This thesis presents a detailed description of the preparation and characterization of nanocrystalline thin films of Cu, Ni, Fe, Constantan, Chromel and Alumel, and their subsequent pairs as thin film thermocouples.





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